]
]
]
]
Project
Characterization of high-K ultrathin oxide layers (CUHKO)
Duration
2002-2004
Keywords
XPS, TOF-SIMS, dielectric, oxide ultra-thin layer
Description
the project aims to establish the methodologies for characterisation of high-k dielectrics for the future (sub-) 100 nm device technologies. The objectives include the fast and non-destructive analysis of single and multi-ellipsometry, X-ray reflectometry, angular resolved, XPS off-line tools with emphasis on the aspects related to quantification and depth resolution (attenuated IR ion mass techniques, ERD and ELS).
Research unit(s)
- (PMR)
- Laboratory for Electron Spectroscopy (LISE)
Staff (finished contracts)
Chairperson(s) |
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| Jean-Jacques PIREAUX | Leader | 081/724606 | |
Academic staff |
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| Laurent HOUSSIAU | Professor | 081/724512 | |
Research staff |
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| Roumen VITCHEV | Researcher | ||
Collaborations
- IMEC, Material and Comonent Analysis
- SOPRA, Paris
- LETI, Grenoble
- Universität München
- ThermoVGscientific, East Grinstead
Contracts
- Union européenne
