Cesium/Xenon co-sputtering, a new approach for a quantitative depth profiling method in ToF-SIMS

Duration

2001-2007

Keywords

depth profiling, Cesium, SIMS, quantification

Description

The thesis aims at developing a semi-quantitative approach for depth-profiling with ToF-SIMS by using a user defined mixture of Cs and Xe in the sputtering beam. Moreover, the project leads to a fudamental understanding of MCs cluster formation and ionization mechanisms.

Research unit(s)

• Laboratory for Electron Spectroscopy (LISE)
• (PMR)

Staff (finished contracts)